4

Reflection of edge states in the fractional quantum Hall regime

Year:
1995
Language:
english
File:
PDF, 508 KB
english, 1995
6

Chloromethane-based reactive ion etching of III–V semiconductor materials

Year:
1993
Language:
english
File:
PDF, 1.57 MB
english, 1993
7

Optical emission spectroscopy of plasma etching of GaAs and InP

Year:
1993
Language:
english
File:
PDF, 253 KB
english, 1993